Dr. Xinhua Liang is an associate professor in the Department of Chemical and Biochemical Engineering at Missouri S&T. He joined the department as an assistant professor in January 2012. He received his Ph.D. in Chemical Engineering from the University of Colorado at Boulder in December 2008 and had three years’ postdoctoral training there. He attended the Chemical Engineering program at Tianjin University, earning his B.S. in June 2001 and M.S. in June 2003. Dr. Liang’s research interests are in the areas of thin film growth on particles by atomic/molecular layer deposition (ALD/MLD), and applying this thin film coating technology to a broad range of energy and environmental materials research, such as nanostructured catalytic materials, storage batteries, solid oxide fuel cells, and nanostructured materials for gas and liquid separation.
Surface science and catalysis, Nanostructured films and devices, Energy and environmental applications
National Science Foundation, Department of Energy, and Industries
Liang Group uses Atomic/Molecular Layer Deposition (ALD/MLD) to design and synthesize nanostructured materials for various applications including important chemical reactions, energy conversion and storage, and environmental remediation. ALD/MLD is a thin film growth technique based on sequential, self-limiting surface chemical reactions and allows for precise deposition of ultra-thin, highly conformal coatings over complex 3D topography structures, with excellent control over stoichiometry and properties. The value in applying this thin film coating technology is to enable to harness the unexpected phenomena that result from the changes in structure and chemistry which occur over atomic scales at surfaces or interfaces.